Journal of Engineering and Applied Sciences
ISSN: Online 1818-7803ISSN: Print 1816-949x
Abstract
In this study, a Dielectric Barrier Discharge DBD plasma system used to affect the pure thin Cadmium Oxide (CdO) films. This system produces non-thermal plasma at atmospheric pressure using frequency (500 kHz) and a voltage between (100-1500 kV). Thin films of cadmium oxide have prepared on clean glass stands at 350 °C by thermal chemical spraying and cadmium acetate (Cd(CH3COO)2.2H2O) was used as a source material of Cd with concentration about (0.1 M) dissolving in 50 mL re-distilled water. The Ultraviolet (UV) spectrum of films using optical absorption calculations which were taken in spectral area between (350-1100 nm), the transmittance and reflectance for films in the Ultraviolet-Visible area (UV-VIS) and effect of exposure to plasma on absorbance, transmittance, absorption coefficient, energy gap, extinction coefficient, refractive index, real and imaginary dielectric constant and optical conductivity have studied in this study. The results showed that both of the transmittance and the energy gap decreases when exposure time for plasma increases while absorption and absorption coefficient, refraction, extinction coefficient, real and imaginary dielectric constant and optical conductivity increase when exposure time for plasma increases.
How to cite this article:
Nisreen Kh. Abdulameer. Impact of Dielectric Barrier Discharge (DBD) Plasma on the Optical Properties of Thin Films.
DOI: https://doi.org/10.36478/jeasci.2020.1937.1942
URL: https://www.makhillpublications.co/view-article/1816-949x/jeasci.2020.1937.1942