TY  - JOUR
T1  - Synthesis and Characterization of Reactive Sputtered AlN Thin Films
AU - , M. Zadam AU - , B. Abdallah AU - , M.Y. Debili AU - , N. Horny AU - , M.A. Djouadi AU - , P.Y. Jouan 
JO  - Journal of Engineering and Applied Sciences
VL  - 2
IS  - 1
SP  - 157
EP  - 160
PY  - 2007
DA  - 2001/08/19
SN  - 1816-949x
DO  - jeasci.2007.157.160
UR  - https://makhillpublications.co/view-article.php?doi=jeasci.2007.157.160
KW  - Aluminum nitride
KW  -thin films
KW  -sputtering
KW  -preferential orientations
AB  - A series of AlN coatings have been elaborated on silicon substrate using dc magnetron sputtering method, by varying the nitrogen flow in the discharge. We have noticed that the coating deposition rate decreases with the nitrogen flow which is conducive to a transition from metallic aluminum coating to (100) and (002) preferentially oriented Aluminum Nitride (AlN). A shorter target-substrate distance gives rise to the (002) orientation, as revealed by the DRX and the SEM characterization.
ER  -