TY  - JOUR
T1  - H Robust Control for a Plasma CF4/O2 System
AU - , K. Chaker 
JO  - International Journal of Soft Computing
VL  - 2
IS  - 4
SP  - 538
EP  - 543
PY  - 2007
DA  - 2001/08/19
SN  - 1816-9503
DO  - ijscomp.2007.538.543
UR  - https://makhillpublications.co/view-article.php?doi=ijscomp.2007.538.543
KW  - Robust control
KW  -H  control
KW  -multi variable control
KW  -ill-conditioned problems
AB  - This study describes a multivariable H <I> </I>robust control approach, for an ill conditioned, difficult to control system, given by a plasma chemical reactor CF4/O2. The control of such a system resulted, in the past, in a slow, oscillatory coupled response. The goals of applying H  robust control, is the achievement of a decent smooth response with minimum oscillations and overshoot. In the pursuit of this goal, we proceed to the quantification of uncertainties affecting the plasma process. Then, the robustness conditions in closed loop, to be achieved, are clearly stated. Only then, the H  algorithm is applied, after the construction of the augmented system resulting from the standard process form. The results obtained showed, clearly, the advantages of the H <I> </I>robust control approach, within the robustness <I>a-priori</I> set conditions.
ER  -